piclist 2001\04\07\064036a >
Thread: Reuse of Photo Resist Developer
face BY : mikeKILLspam@@spam@whitewing.co.uk

On Fri, 6 Apr 2001 20:06:53 -0400, you wrote:

{Quote hidden}

Don't use sodium hydroxide developer it's rather temperature
sensitive, prone to over or under develop, and made-up solution
doesn't last long. The only good thing about it is it's cheap, but
this is false economy after you've wrecked a couple of boards due to
over or underdevelopment.
Silicate based developer is WAY better - the solution lasts basically
forever - you can just top-up when it gets weak, and it has a HUGE
margin between developing and overdeveloping, i.e. you can leave the
board in for several (>10) times the normal develop time without
damage. In practice this means you can use it really strong, so boards
develop in 5-10 seconds. Once you've used this stuff you'll never go
back to hydroxide!
More info, including a silicate developer recipie, at

http://www.piclist.com hint: PICList Posts must start with ONE topic:
[PIC]:,[SX]:,[AVR]: ->uP ONLY! [EE]:,[OT]: ->Other [BUY]:,[AD]: ->Ads

<8mktcto0fs34i0o1ob95eillnglu7qau70@4ax.com> quoted-printable

In reply to: <F172utox7nyeKzGZuNY00000e8b@hotmail.com>
See also: www.piclist.com/techref/index.htm?key=reuse+photo+resist
Reply You must be a member of the piclist mailing list (not only a www.piclist.com member) to post to the piclist. This form requires JavaScript and a browser/email client that can handle form mailto: posts.
Subject (change) Reuse of Photo Resist Developer

month overview.

new search...